2 Muffle Furnaces
Heraeus Instruments (now ThermoFisher Scientific) both capable to reach temperatures up to 1200°C
- Small version, heating chamber size approx. 250mm x 180mm x 150mm
- Large version, heating chamber size approx. 400mm x 300mm x 220mm
Drying Oven
Heraeus type UT6200 (now Weiss-technik) for temperatures up to 300°C
Infrared Furnace
type behr IRF10 from behr-Labor-Technik
- Specimens are placed in a quartz tube
- Temperature of up to 1000°C is reachable within 10s
- Flushing with inert or reactive gases
- Annealing programme is computer programmable
- For drying, pyrolysis, targeted evaporation of sample constituents
Prototype high-power laser-based fast heating device
For thermal cycling of e.g. thin films on silicon substrates, a laser-based fast thermal cycling device (~1 Hz) was developed. It is based on an infrared laser (wavelength 940nm, type LM250 diode laser, Mergenthaler GmbH) heating up the volume of the silicon substrate by using a short laser pulse with a duration of tenths of a second. Film surface temperature is measured using a pyrometer.
Further detail on the experimental setup and results:
Stefan Wurster, Stephan Bigl, Megan J. Cordill, Daniel Kiener, Accelerated thermo-mechanical fatigue of copper metallizations studied by pulsed laser heating, (2016), Microelectronic Engineering, https://doi.org/10.1016/j.mee.2016.08.004
Stephan Bigl, C.O.W. Trost, Stefan Wurster, Megan J. Cordill, Daniel Kiener, Film thickness dependent microstructural changes of thick copper metallizations upon thermal fatigue, (2017), Journal of Materials Research, https://doi.org/10.1557/jmr.2017.199