Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...
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| Yayın Tarihi: | 2020 |
| Dil: | English |
| Fiziksel Özellikler: | 1 electronic resource (142 p.) |
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Elektronik
| DOAB Directory of Open Access Books | Kütüphanede |