Atomic Layer Deposition
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...
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| Anno di pubblicazione: | 2020 |
| Lingua: | English |
| Descrizione fisica: | 1 electronic resource (142 p.) |
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| DOAB Directory of Open Access Books | Disponibile |