Atomic Layer Deposition

Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component co...

Disgrifiad llawn

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Sonstige:
Blwyddyn Gyhoeddi:2020
Iaith:English
Disgrifiad Corfforoll:1 electronic resource (142 p.)
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